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Non-destructive Analysis (NDA)

Circuit Edit (CKT)

Materials Analysis (MA)

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Software

MA-tek FTP

Nano Probing

Technical Concept

Atomic force microscopy (AFM) based nanoprobers is one of state-of-the-art solutions to achieve precise fault isolation in nano-scale with its high spatial resolution.

How to achieve precise fault isolation in nano-scale is a challenge and urgent task with the fast-paced development of miniaturization technology. With its high spatial resolution, atomic force microscopy (AFM) based nanoprobers is one of state-of-the-art solutions for such a purpose.

 

Different from SEM-based nanoprobers, the loading force of probers for the AFM-based nanoprober can be precisely controlled via a feedback system and most impressively, electron accumulation effect which may cause electrical damage is negligible during probing. Nowadays, this technology provides special resolving power down to 10 nm.

 

The AFM-based nanoprober also provides many AFM-related functions, such as pico-current imaging and scanning capacitance microscopy (SCM). These functions strengthen the inspection power for failure analysis and therefore such technology is promising in the application of developing advanced semiconductor devices.

 

 

Specifications/capability

  1. Measuring technology node can be down to 10 nm
  2. 8 prober
  3. W tips/apex diameter: 15-35 nm
  4. Low contact resistance < 30 ohm
  5. Target area < 200 um
  6. Low thermal drift ~ 1 nm
  7. Nitrogen purged environmental enclosure to prevent oxidation 

 

Features

  1. High-spatial resolution ~ 10 nm
  2. No electron beam effect
  3. Contact/tapping modes imaging
  4. Force feedback control
  5. Pico-current sensitivity ~ 5 pA
  6. Scanning capacitance microscopy function

 

 

 

Equipment

 

 

(a) OM image of 8 probes ; (b) Tapping mode AFM image

 

 

With the help of pico-current, the current on a specific path can be measured.

(a) OM image of ROI ; (b) AFM image of ROI ; (c) Pico-current image

 

 

With the help of pico-current and SCM, failure locations can be identified for further FA analysis. Areas marked by a red circuit and a black ellipse exhibit the failure locations. Images are provided by Multiprobe, DCG.

 (a) Pico-current ; (b) SCM

 

 

Contact

Taiwan Lab

Nano Probe team

: +886-3-6116678 ext:3101

: +886-983-617-997

nanoprobe@ma-tek.com