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OP(Optical Profiler)

Technical Concept
OP, optical profiler, is a surface profiler to measure the morphology and topography of any features on the very top surface of materials. The detection mechanism is based on WSI (white-light scanning interferometry) to image a specific feature 3-dimensionally. The image modes include vertical scanning mode and phase shift interferometry (PSI) mode. It is kind of non-contact, non-destructive method to investigate a surface feature precisely. Microstructures, such as bumps or ditches, can be measured by step height, surface roughness, waviness, and 3-dimentional stereography.

Application of this technique has been widely employed in Au bumps fabrication, metal fingers formation on FPC, photo mask inspection, surface defects characterization, surface roughness of LED dice, in-line inspection of photo spacer in TFT cells.



Equipment Capacity

Nano View NVE-10100



Application

Surface defects characterization, (a) OP, (b) SEM

Metal fingers formation on FPC Photo mask inspection

Au bumps fabrication, (a) OP, (b) SEM

 
Gold electrodes of LED dice In-line inspection of photo spacer in TFT cells
 
Step height and dimension measurement of LED
 
 
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Ms. Chenze Yang
TEL:+886-3-6116678 ext:3961
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Email:
op@ma-tek.com
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