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OP(Optical Profiler)
Technical Concept
OP, optical profiler, is a surface profiler to measure the morphology and topography of any features on the very top surface of materials. The detection mechanism is based on WSI (white-light scanning interferometry) to image a specific feature 3-dimensionally. The image modes include vertical scanning mode and phase shift interferometry (PSI) mode. It is kind of non-contact, non-destructive method to investigate a surface feature precisely. Microstructures, such as bumps or ditches, can be measured by step height, surface roughness, waviness, and 3-dimentional stereography.
Application of this technique has been widely employed in Au bumps fabrication, metal fingers formation on FPC, photo mask inspection, surface defects characterization, surface roughness of LED dice, in-line inspection of photo spacer in TFT cells.
Equipment Capacity
Nano View NVE-10100
Application
| Surface defects characterization, (a) OP, (b) SEM |
| Metal fingers formation on FPC |
Photo mask inspection |
| Au bumps fabrication, (a) OP, (b) SEM |
| Gold electrodes of LED dice |
In-line inspection of photo spacer in TFT cells |
| Step height and dimension measurement of LED |
Contact Window
Ms. Chenze Yang
TEL:+886-3-6116678 ext:3961
Mobile:+886-952-303810
Email:op@ma-tek.com
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